Vertical and Smooth Single-Step Reactive Ion Etching Process for InP Membrane Waveguides

Novel two-step etching process for ion tracks in polyimide

Polyimide is of great technical importance because of its excellent material properties (including chemical inertness and radiation resistance) which are maintained even at low and at high temperatures. When thin polyimide foils are irradiated with energetic heavy ions, long nanometric tracks are formed. Under suitable conditions, the damaged material along these tracks is dissolved and develop...

Reactive ion etching

The reactive ion etching ofInP, InGaAs, and InAIAs in CClzF2/02 or C2R(/H2 discharges was investigated as a function of the plasma parameters pressure, power density, flow rate, and relative composition. The etch rates of these materials are a factor of 3-5 X faster in CC12F 2/0 2 (-600--1000 AminJ ) compared to CzHJH2 (160-320 AminI ). Significantly smoother morphologies are obtained with C2H6...

Crystallographic Orientation Dependent Reactive Ion Etching in Single Crystal Diamond.

Sculpturing desired shapes in single crystal diamond is ever more crucial in the realization of complex devices for nanophotonics, quantum computing, and quantum optics. The crystallographic orientation dependent wet etch of single crystalline silicon in potassium hydroxide (KOH) allows a range of shapes to be formed and has significant impacts on microelectromechanical systems (MEMS), atomic f...

InP-based Waveguides: comparison of ECR Plasma Etching and Wet-chemical Etching

1 COBRA Inter-University Research Institute on Communication Technology Eindhoven University of Technology –Faculty of Electrical Engineering Telecommunications Technology and Electromagnetics – Opto-Electronic Devices Group P.O.Box 513, 5600 MB Eindhoven, The Netherlands E-mail: [email protected] 2 Department of Electronic Materials Engineering, Research School of Physical Sciences and En...

Deep Reactive Ion Etching (DRIE)